中文簡介

《真空》是一份國際性的快速出版期刊，專注于短時間的交流。所有的論文都是同行評審的，評審過程是面向快速周轉時間的簡短溝通。該雜志還發表了完整的研究論文、專題論文和一些重要會議的精選論文。一份真空報告應代表一個領域的重大進展，該領域涉及一個大氣壓或以下的受控環境。期刊的范圍包括:1. 真空;在真空抽真空和儀器儀表、真空測量、真空氣體動力學、氣體表面相互作用、特高壓應用的表面處理和低放氣、真空熔煉、燒結和真空計量方面的最初發展。大型設施(如粒子加速器和聚變裝置)的技術和解決方案。新儀器(如探測器和電子顯微鏡)。2. 等離子體科學;PVD、CVD、等離子輔助CVD、離子源、沉積過程及分析等方面的研究進展。3.表面科學;表面工程，表面化學，表面分析，晶體生長，離子-表面相互作用和蝕刻，納米尺度處理，表面改性。4. 材料科學;新穎的功能或結構材料。金屬、陶瓷和聚合物。用于理解結構-屬性關系的實驗、模擬和建模。薄膜和涂料。納米結構和離子注入。簡短交流的目的是讓研究人員能夠快速地與同事分享他們最令人興奮的工作。從提交到最終決定的預期時間約為6.4周。

　　英文簡介

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.The scope of the journal includes:1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.The aim of the short communications is to enable researchers to rapidly share their most exciting work with their colleagues. The expected time from submission to final decision is approximately 6.4 weeks.

　　近年期刊自引率趨勢圖

　　JCR分區

JCR分區等級	JCR所屬學科	分區	影響因子
Q2	PHYSICS, APPLIED	Q2	4.11
	MATERIALS SCIENCE, MULTIDISCIPLINARY	Q2

　　近年期刊影響因子趨勢圖

　　CiteScore數值

CiteScore	SJR	SNIP	學科類別	分區	排名	百分位
6.40	0.738	1.185	大類：Physics and Astronomy 小類：Instrumentation	Q1	13 / 136	90%
			大類：Physics and Astronomy 小類：Surfaces, Coatings and Films	Q1	22 / 129	83%
			大類：Physics and Astronomy 小類：Condensed Matter Physics	Q1	77 / 415	81%

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